Chemical Vapour Deposition, (CVD) basic principles In the original form, the procedure consist of two isothermal reactions: a.)at T1 temperature M +nX  MX n (M layer forming metal, X halogen) At T1 a volatile compound is formed b.) at T2 (T2 > T1 ) MX n  M + nX Thermal decomposition of MXn occur on the substrate surface Subsequently the decomposition process, the halogen molecule is circuated (in order to form new volatile molecules) Typical chemical reactions in the CVD procedure: Metal-halogenides are often used as precursor materials in these techniques.
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