Functional resist : semiconducting polymer
{"Image DocumentName": "Functional resist : semiconducting polymer", "Image ImageDescription": "SEM image of 200nm period MEH-PPV grating R-P3HT grating with 200nm period. 1 \uf06dm. MEH-PPV Tg=65oC. Hot embossing at 120oC and 20bar. MEH-PPV spun on a PEDOT/ITO/glass. R-P3HT 200nm period grating. NIL at 160oC and 35 bar. Strong physical bond, high transition temperature.", "Image XResolution": "37", "Image YResolution": "37", "Image ResolutionUnit": "Pixels/Centimeter", "Image Software": "SlidePlayer", "Image YCbCrPositioning": "Centered"}