Combined UV (for macro) and nanoimprint lithography (for nano)
{"Image DocumentName": "Combined UV (for macro) and nanoimprint lithography (for nano)", "Image ImageDescription": "hybrid mask-mold. SU-8 is used both as a photo-resist and thermal NIL resist. (SU-8 is a photo-resist, but not a UV-NIL resist (hard to imprint at RT). Instead, it can be used as a thermal NIL resist, Tg\uf07e50oC) Schematics of the technique by using a hybrid mask-mold for one-step lithography of both large- and nano-patterns. SEM micrograph of resist patterns obtained by the technique with hybrid mask-mold. Cheng, One-step lithography for various size patterns with a hybrid mask-mold , Microelectronic Engineering 71, 288\u2013293 (2004).", "Image XResolution": "37", "Image YResolution": "37", "Image ResolutionUnit": "Pixels/Centimeter", "Image Software": "SlidePlayer", "Image YCbCrPositioning": "Centered"}